APA (7th ed.) Citation

Gorsak, C. A., Bowman, H. J., Gann, K. R., Buontempo, J. T., Smith, K. T., Tripathi, P., . . . Nair, H. P. (2024). In situ etching of β-Ga2O3 using tert-butyl chloride in an MOCVD system. Applied Physics Letters, 125(24), 1. https://doi.org/10.1063/5.0239152

Chicago Style (17th ed.) Citation

Gorsak, Cameron A., et al. "In Situ Etching of β-Ga2O3 Using Tert-butyl Chloride in an MOCVD System." Applied Physics Letters 125, no. 24 (2024): 1. https://doi.org/10.1063/5.0239152.

MLA (9th ed.) Citation

Gorsak, Cameron A., et al. "In Situ Etching of β-Ga2O3 Using Tert-butyl Chloride in an MOCVD System." Applied Physics Letters, vol. 125, no. 24, 2024, p. 1, https://doi.org/10.1063/5.0239152.