Defect Tailoring in HfO 2 /Si Films upon Post-Deposition Annealing and Ultraviolet Irradiation.

Saved in:
Bibliographic Details
Title: Defect Tailoring in HfO 2 /Si Films upon Post-Deposition Annealing and Ultraviolet Irradiation.
Authors: Salas-Rodríguez, Silvestre1, ssalas84@gmail.com, González-Moreno, Fernanda I.2, fgonzalezm2103@alumno.ipn.mx, Woo-García, Rosa M.3, rwoo@uv.mx, Herrera-May, Agustín L.1, leherrera@uv.mx, López-Huerta, Francisco3, frlopez@uv.mx, Caballero-Briones, Felipe2, fcaballero@ipn.mx
Source: Applied Sciences (2076-3417); Feb2025, Vol. 15 Issue 3, p1573, 14p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
Description
ISSN:20763417
DOI:10.3390/app15031573