APA (7th ed.) Citation

Ning, J., Niu, C., Tang, Z., Sun, Y., Yan, H., & Zhou, D. (2025). Optimizing the PECVD Process for Stress-Controlled Silicon Nitride Films: Enhancement of Tensile Stress via UV Curing and Layered Deposition. Coatings (2079-6412), 15(6), 708. https://doi.org/10.3390/coatings15060708

Chicago Style (17th ed.) Citation

Ning, Jianping, Chunjie Niu, Zhen Tang, Yue Sun, Hao Yan, and Dayu Zhou. "Optimizing the PECVD Process for Stress-Controlled Silicon Nitride Films: Enhancement of Tensile Stress via UV Curing and Layered Deposition." Coatings (2079-6412) 15, no. 6 (2025): 708. https://doi.org/10.3390/coatings15060708.

MLA (9th ed.) Citation

Ning, Jianping, et al. "Optimizing the PECVD Process for Stress-Controlled Silicon Nitride Films: Enhancement of Tensile Stress via UV Curing and Layered Deposition." Coatings (2079-6412), vol. 15, no. 6, 2025, p. 708, https://doi.org/10.3390/coatings15060708.