APA (7th ed.) Citation

Rummel, B. D., Klesko, J. P., Meyerson, M. L., Ohlhausen, J. A., Glaser, C. E., Binder, A. T., . . . Kaplar, R. J. (2025). Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 43(4), 1. https://doi.org/10.1116/6.0004311

Chicago Style (17th ed.) Citation

Rummel, B. D., J. P. Klesko, M. L. Meyerson, J. A. Ohlhausen, C. E. Glaser, A. T. Binder, P. T. Dickens, and R. J. Kaplar. "Interfacial Oxide and Other Species in Trimethylaluminum-pretreated Atomic Layer Deposition-Al2O3/GaN Characterized by Sputter-assisted ToF-SIMS." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 43, no. 4 (2025): 1. https://doi.org/10.1116/6.0004311.

MLA (9th ed.) Citation

Rummel, B. D., et al. "Interfacial Oxide and Other Species in Trimethylaluminum-pretreated Atomic Layer Deposition-Al2O3/GaN Characterized by Sputter-assisted ToF-SIMS." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 43, no. 4, 2025, p. 1, https://doi.org/10.1116/6.0004311.