APA (7th ed.) Citation

Thelven, J. M., Margavio, H. R. M., Oh, H., Efaw, C. M., Davis, P. H., Graugnard, E., & Parsons, G. N. (2025). "Three‐Color" Chemical Selectivity between Oxide, Nitride, and Silicon: Area‐Selective Deposition of Metal Oxide and Polymer on SiN and Si‐H versus SiO2. Advanced Materials Technologies, 10(23), 1. https://doi.org/10.1002/admt.202500284

Chicago Style (17th ed.) Citation

Thelven, Jeremy M., Hannah R. M. Margavio, Hwan Oh, Corey M. Efaw, Paul H. Davis, Elton Graugnard, and Gregory N. Parsons. ""Three‐Color" Chemical Selectivity Between Oxide, Nitride, and Silicon: Area‐Selective Deposition of Metal Oxide and Polymer on SiN and Si‐H Versus SiO2." Advanced Materials Technologies 10, no. 23 (2025): 1. https://doi.org/10.1002/admt.202500284.

MLA (9th ed.) Citation

Thelven, Jeremy M., et al. ""Three‐Color" Chemical Selectivity Between Oxide, Nitride, and Silicon: Area‐Selective Deposition of Metal Oxide and Polymer on SiN and Si‐H Versus SiO2." Advanced Materials Technologies, vol. 10, no. 23, 2025, p. 1, https://doi.org/10.1002/admt.202500284.