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In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry.

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Bibliographic Details
Title:	In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry.
Authors:	Qiang, Jun¹, Luo, Kunjie¹, Dong, Yanzhuo¹, Jiang, Bingyan¹, jby@csu.edu.cn, Drummer, Dietmar², Roth, Benedikt²
Source:	Journal of The Electrochemical Society; Dec2020, Vol. 167 Issue 16, p1-6, 6p
Database:	Applied Science & Technology Source

Description
ISSN:	00134651
DOI:	10.1149/1945-7111/abcb78