APA (7th ed.) Citation

Qiang, J., Luo, K., Dong, Y., Jiang, B., Drummer, D., & Roth, B. (2020). In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry. Journal of The Electrochemical Society, 167(16), 1. https://doi.org/10.1149/1945-7111/abcb78

Chicago Style (17th ed.) Citation

Qiang, Jun, Kunjie Luo, Yanzhuo Dong, Bingyan Jiang, Dietmar Drummer, and Benedikt Roth. "In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry." Journal of The Electrochemical Society 167, no. 16 (2020): 1. https://doi.org/10.1149/1945-7111/abcb78.

MLA (9th ed.) Citation

Qiang, Jun, et al. "In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry." Journal of The Electrochemical Society, vol. 167, no. 16, 2020, p. 1, https://doi.org/10.1149/1945-7111/abcb78.