Superresolution patterning in g-line photoresist and silicon assisted by direct-laser-written Ge10Sb90 heat-mode resist film.
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| Title: | Superresolution patterning in g-line photoresist and silicon assisted by direct-laser-written Ge10Sb90 heat-mode resist film. |
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| Authors: | Shen, Juntao1,2, Zhang, Kui1,2, zkui1939@163.com, Liu, Wenbo1,3, Wei, Jingsong1,2, weijingsong@siom.ac.cn, Wang, Yang1,2, ywang@siom.ac.cn |
| Source: | Materials Science in Semiconductor Processing; Jul2026, Vol. 209, pN.PAG-N.PAG, 1p |
| Database: | Applied Science & Technology Source |
| ISSN: | 13698001 |
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| DOI: | 10.1016/j.mssp.2026.110637 |
