APA (7th ed.) Citation

Shen, J., Zhang, K., Liu, W., Wei, J., & Wang, Y. (2026). Superresolution patterning in g-line photoresist and silicon assisted by direct-laser-written Ge10Sb90 heat-mode resist film. Materials Science in Semiconductor Processing, 209, N.PAG. https://doi.org/10.1016/j.mssp.2026.110637

Chicago Style (17th ed.) Citation

Shen, Juntao, Kui Zhang, Wenbo Liu, Jingsong Wei, and Yang Wang. "Superresolution Patterning in G-line Photoresist and Silicon Assisted by Direct-laser-written Ge10Sb90 Heat-mode Resist Film." Materials Science in Semiconductor Processing 209 (2026): N.PAG. https://doi.org/10.1016/j.mssp.2026.110637.

MLA (9th ed.) Citation

Shen, Juntao, et al. "Superresolution Patterning in G-line Photoresist and Silicon Assisted by Direct-laser-written Ge10Sb90 Heat-mode Resist Film." Materials Science in Semiconductor Processing, vol. 209, 2026, p. N.PAG, https://doi.org/10.1016/j.mssp.2026.110637.