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Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.

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Bibliographic Details
Title: Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.
Authors: Guan, Hengrui1,2,3, Lei, Xuefeng2,3, Chu, Yuheng1,2,3, Zhao, Xinxin1,2,3, Kuang, Dapeng2,3, Song, Maoxin2,3, Ling, Mingchun2,3, Hong, Jin2,3
Source: Photonics; May2026, Vol. 13 Issue 5, p481, 24p
Database: Applied Science & Technology Source
Description
ISSN:23046732
DOI:10.3390/photonics13050481