APA (7th ed.) Citation

Guan, H., Lei, X., Chu, Y., Zhao, X., Kuang, D., Song, M., . . . Hong, J. (2026). Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography. Photonics, 13(5), 481. https://doi.org/10.3390/photonics13050481

Chicago Style (17th ed.) Citation

Guan, Hengrui, Xuefeng Lei, Yuheng Chu, Xinxin Zhao, Dapeng Kuang, Maoxin Song, Mingchun Ling, and Jin Hong. "Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 Nm Lithography." Photonics 13, no. 5 (2026): 481. https://doi.org/10.3390/photonics13050481.

MLA (9th ed.) Citation

Guan, Hengrui, et al. "Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 Nm Lithography." Photonics, vol. 13, no. 5, 2026, p. 481, https://doi.org/10.3390/photonics13050481.