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Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.

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Title: Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.
Authors: Guan, Hengrui1,2,3, Lei, Xuefeng2,3, Chu, Yuheng1,2,3, Zhao, Xinxin1,2,3, Kuang, Dapeng2,3, Song, Maoxin2,3, Ling, Mingchun2,3, Hong, Jin2,3
Source: Photonics; May2026, Vol. 13 Issue 5, p481, 24p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 194184710
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.
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  Data: <searchLink fieldCode="JN" term="%22Photonics%22">Photonics</searchLink>; May2026, Vol. 13 Issue 5, p481, 24p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=194184710
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.3390/photonics13050481
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      – Code: eng
        Text: English
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        PageCount: 24
        StartPage: 481
    Titles:
      – TitleFull: Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography.
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            NameFull: Guan, Hengrui
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            NameFull: Lei, Xuefeng
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            NameFull: Chu, Yuheng
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            NameFull: Zhao, Xinxin
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            NameFull: Kuang, Dapeng
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            NameFull: Song, Maoxin
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            NameFull: Ling, Mingchun
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            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
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              Value: 13
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              Value: 5
          Titles:
            – TitleFull: Photonics
              Type: main
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