View in EDS

Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition.

Saved in:
Bibliographic Details
Title: Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition.
Authors: Mestanza, S. N. M.1, nilo@led.unicamp.br, Obrador, M. P.2, Rodriguez, E.3, Biasotto, C.4, Doi, I.4, Diniz, J. A.4, Swart, J. W.4
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Mar/Apr2006, Vol. 24 Issue 2, p823-827, 5p, 8 Graphs
Database: Applied Science & Technology Source
Description
ISSN:10711023
DOI:10.1116/1.2181577