Substrate current enhancement in 65 nm metal-oxide-silicon field-effect transistor under external mechanical stress
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| Title: | Substrate current enhancement in 65 nm metal-oxide-silicon field-effect transistor under external mechanical stress |
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| Authors: | Kuo, Y.J.1, Chang, T.C.1,2,3, tcchang@mail.phys.nsysu.edu.tw, Yeh, P.H.4, Chen, S.C.2, Dai, C.H.1, Chao, C.H.5, Young, T.F.5, Cheng, Osbert6, Huang, C.T.6 |
| Source: | Thin Solid Films; Jan2009, Vol. 517 Issue 5, p1715-1718, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00406090 |
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| DOI: | 10.1016/j.tsf.2008.09.031 |
