Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.
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| Title: | Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2. |
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| Authors: | Hanada, T., Aikawa, T., Soga, N. |
| Source: | Journal of the American Ceramic Society; January 1984, Vol. 67, p52-56, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00027820 |
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| DOI: | 10.1111/j.1151-2916.1984.tb19147.x |
