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Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.

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Bibliographic Details
Title: Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.
Authors: Hanada, T., Aikawa, T., Soga, N.
Source: Journal of the American Ceramic Society; January 1984, Vol. 67, p52-56, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500042490
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+American+Ceramic+Society%22">Journal of the American Ceramic Society</searchLink>; January 1984, Vol. 67, p52-56, 5p
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RecordInfo BibRecord:
  BibEntity:
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      – Type: doi
        Value: 10.1111/j.1151-2916.1984.tb19147.x
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 52
    Titles:
      – TitleFull: Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.
        Type: main
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            NameFull: Hanada, T.
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            NameFull: Aikawa, T.
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            NameFull: Soga, N.
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            – D: 01
              M: 01
              Text: January 1984
              Type: published
              Y: 1984
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              Value: 67
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            – TitleFull: Journal of the American Ceramic Society
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