View in EDS

Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.

Saved in:
Bibliographic Details
Title: Physical properties and structure of rf-sputtered amorphous films in the system TiO2-SiO2.
Authors: Hanada, T., Aikawa, T., Soga, N.
Source: Journal of the American Ceramic Society; January 1984, Vol. 67, p52-56, 5p
Database: Applied Science & Technology Source
Be the first to leave a comment!
You must be logged in first