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Characterization of AZ PN114 resist for soft-x-ray projection lithography.

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Bibliographic Details
Title: Characterization of AZ PN114 resist for soft-x-ray projection lithography.
Authors: Early, K., Tennant, D. M., Jeon, D. Y.
Source: Applied Optics; December 1 1993, Vol. 32, p7044-7049, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500198514
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Characterization of AZ PN114 resist for soft-x-ray projection lithography.
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RecordInfo BibRecord:
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        Value: 10.1364/AO.32.007044
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 7044
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      – TitleFull: Characterization of AZ PN114 resist for soft-x-ray projection lithography.
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            NameFull: Early, K.
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            NameFull: Tennant, D. M.
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            NameFull: Jeon, D. Y.
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            – D: 01
              M: 12
              Text: December 1 1993
              Type: published
              Y: 1993
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              Value: 32
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