Implantation temperature effect on polycrystalline silicon by ion shower doping.
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| Title: | Implantation temperature effect on polycrystalline silicon by ion shower doping. |
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| Authors: | Mishima, Y., Takei, M., Matsumoto, N. |
| Source: | Journal of Applied Physics; December 15 1993, Vol. 74, p7114-7117, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.355026 |
