Investigations on high-temperature thermal oxidation process at top and bottom interfaces of top silicon of SIMOX wafers.
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| Title: | Investigations on high-temperature thermal oxidation process at top and bottom interfaces of top silicon of SIMOX wafers. |
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| Authors: | Nakashima, S., Katayama, T., Miyamura, Y. |
| Source: | Journal of the Electrochemical Society; January 1996, Vol. 143, p244-251, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.1836416 |
