High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD.
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| Title: | High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD. |
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| Authors: | Takagi, T., Takechi, K., Nakagawa, Y. |
| Source: | Vacuum; December 1998, Vol. 51 Issue 4, p751-755, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 0042207X |
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| DOI: | 10.1016/S0042-207X(98)00284-X |
