Kusano, E., Kashiwagi, N., & Kobayashi, T. (1998). Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings. Vacuum, 51(4), 785. https://doi.org/10.1016/S0042-207X(98)00291-7
Chicago Style (17th ed.) CitationKusano, E., N. Kashiwagi, and T. Kobayashi. "Effects of CH4 Addition to Ar-O2 Discharge Gases on Resistivity and Structure of ITO Coatings." Vacuum 51, no. 4 (1998): 785. https://doi.org/10.1016/S0042-207X(98)00291-7.
MLA (9th ed.) CitationKusano, E., et al. "Effects of CH4 Addition to Ar-O2 Discharge Gases on Resistivity and Structure of ITO Coatings." Vacuum, vol. 51, no. 4, 1998, p. 785, https://doi.org/10.1016/S0042-207X(98)00291-7.
Warning: These citations may not always be 100% accurate.