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Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings.

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Title: Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings.
Authors: Kusano, E., Kashiwagi, N., Kobayashi, T.
Source: Vacuum; December 1998, Vol. 51 Issue 4, p785-789, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500456202
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings.
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  Data: <searchLink fieldCode="AU" term="%22Kusano%2C+E%2E%22">Kusano, E.</searchLink><br /><searchLink fieldCode="AU" term="%22Kashiwagi%2C+N%2E%22">Kashiwagi, N.</searchLink><br /><searchLink fieldCode="AU" term="%22Kobayashi%2C+T%2E%22">Kobayashi, T.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Vacuum%22">Vacuum</searchLink>; December 1998, Vol. 51 Issue 4, p785-789, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500456202
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        Value: 10.1016/S0042-207X(98)00291-7
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 785
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      – TitleFull: Effects of CH4 addition to Ar-O2 discharge gases on resistivity and structure of ITO coatings.
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            NameFull: Kusano, E.
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            NameFull: Kashiwagi, N.
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            NameFull: Kobayashi, T.
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              M: 12
              Text: December 1998
              Type: published
              Y: 1998
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