Methods of defect-engineering shallow junctions formed by B+-implantation in Si.

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Bibliographic Details
Title: Methods of defect-engineering shallow junctions formed by B+-implantation in Si.
Authors: Roth, E. G., Holland, O. W., Venezia, V. C.
Source: Journal of Electronic Materials; November 1997, Vol. 26, p1349-1354, 6p
Database: Applied Science & Technology Source
Description
ISSN:03615235
DOI:10.1007/s11664-997-0083-y