Ultrashallow thermal donor formation in silicon by annealing in ambient oxygen.
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| Title: | Ultrashallow thermal donor formation in silicon by annealing in ambient oxygen. |
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| Authors: | Å;berg, D., Linnarsson, M. K., Svensson, B. G. |
| Source: | Journal of Applied Physics; June 15 1999, Vol. 85 Issue 12, p8054-8059, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.370642 |
