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Ultrashallow thermal donor formation in silicon by annealing in ambient oxygen.

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Bibliographic Details
Title: Ultrashallow thermal donor formation in silicon by annealing in ambient oxygen.
Authors: Å;berg, D., Linnarsson, M. K., Svensson, B. G.
Source: Journal of Applied Physics; June 15 1999, Vol. 85 Issue 12, p8054-8059, 6p
Database: Applied Science & Technology Source
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