10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist.
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| Title: | 10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist. |
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| Authors: | Robinson, A. P. G., Palmer, R. E., Tada, T. |
| Source: | Journal of Physics: D Applied Physics; August 21 1999, Vol. 32 Issue 16, pL75-L78, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00223727 |
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