Cracking mechanism in AlN(112̄0)/α-Al2O3(11̄02) heteroepitaxial films growth by MOCVD.
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| Title: | Cracking mechanism in AlN(112̄0)/α-Al2O3(11̄02) heteroepitaxial films growth by MOCVD. |
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| Authors: | Kaigawa, K., Shibata, T., Nakamura, Y. |
| Source: | Journal of Materials Science; October 1 2001, Vol. 36 Issue 19, p4649-4659, 11p |
| Database: | Applied Science & Technology Source |
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