APA (7th ed.) Citation

Sawano, K., Kawaguchi, K., & Koh, S. (2003). Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning. Journal of the Electrochemical Society, 150(7), G376. https://doi.org/10.1149/1.1576773

Chicago Style (17th ed.) Citation

Sawano, K., K. Kawaguchi, and S. Koh. "Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning." Journal of the Electrochemical Society 150, no. 7 (2003): G376. https://doi.org/10.1149/1.1576773.

MLA (9th ed.) Citation

Sawano, K., et al. "Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning." Journal of the Electrochemical Society, vol. 150, no. 7, 2003, p. G376, https://doi.org/10.1149/1.1576773.