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Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning.

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Bibliographic Details
Title: Surface Planarization of Strain-Relaxed SiGe Buffer Layers by CMP and Post Cleaning.
Authors: Sawano, K., Kawaguchi, K., Koh, S.
Source: Journal of the Electrochemical Society; July 2003, Vol. 150 Issue 7, pG376-G379, 4p
Database: Applied Science & Technology Source
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