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Barrier-limited surface diffusion in atom lithography.

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Bibliographic Details
Title: Barrier-limited surface diffusion in atom lithography.
Authors: Sligte, E. te, Stam, K. M. R. van der, Smeets, B.
Source: Journal of Applied Physics; 2/15/2004, Vol. 95 Issue 4, p1749-1755, 7p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500956569
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Barrier-limited surface diffusion in atom lithography.
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  Data: <searchLink fieldCode="AU" term="%22Sligte%2C+E%2E+te%22">Sligte, E. te</searchLink><br /><searchLink fieldCode="AU" term="%22Stam%2C+K%2E+M%2E+R%2E+van+der%22">Stam, K. M. R. van der</searchLink><br /><searchLink fieldCode="AU" term="%22Smeets%2C+B%2E%22">Smeets, B.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; 2/15/2004, Vol. 95 Issue 4, p1749-1755, 7p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500956569
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      – Type: doi
        Value: 10.1063/1.1638613
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 1749
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      – TitleFull: Barrier-limited surface diffusion in atom lithography.
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            NameFull: Sligte, E. te
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            NameFull: Stam, K. M. R. van der
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            NameFull: Smeets, B.
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              Text: 2/15/2004
              Type: published
              Y: 2004
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