Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique.
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| Title: | Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique. |
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| Authors: | Kim, J. B., Kwon, D. R., Chakrabarti, K. |
| Source: | Journal of Applied Physics; December 1 2002, Vol. 92 Issue 11, p6739-6742, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1515951 |
