A complex x-ray characterization of epitaxially grown high-K gate dielectrics.
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| Title: | A complex x-ray characterization of epitaxially grown high-K gate dielectrics. |
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| Authors: | Zaumseil, P., Schroeder, T. |
| Source: | Journal of Physics: D Applied Physics; May 21 2005, Vol. 38, pA179-A183, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00223727 |
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| DOI: | 10.1088/0022-3727/38/10A/034 |
