A complex x-ray characterization of epitaxially grown high-K gate dielectrics.
Saved in:
| Title: | A complex x-ray characterization of epitaxially grown high-K gate dielectrics. |
|---|---|
| Authors: | Zaumseil, P., Schroeder, T. |
| Source: | Journal of Physics: D Applied Physics; May 21 2005, Vol. 38, pA179-A183, 5p |
| Database: | Applied Science & Technology Source |
Be the first to leave a comment!