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Real-Time In Situ Tracking of Gas-Phase Carbon-to-Silicon Ratio During Hot-Wall CVD Growth of SiC.

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Title: Real-Time In Situ Tracking of Gas-Phase Carbon-to-Silicon Ratio During Hot-Wall CVD Growth of SiC.
Authors: Vanmil, B. L., Lew, K. K., Myers-Ward, R. L.
Source: Journal of Electronic Materials; May 2008, Vol. 37 Issue 5, p685-690, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501248935
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Real-Time In Situ Tracking of Gas-Phase Carbon-to-Silicon Ratio During Hot-Wall CVD Growth of SiC.
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  Data: <searchLink fieldCode="AU" term="%22Vanmil%2C+B%2E+L%2E%22">Vanmil, B. L.</searchLink><br /><searchLink fieldCode="AU" term="%22Lew%2C+K%2E+K%2E%22">Lew, K. K.</searchLink><br /><searchLink fieldCode="AU" term="%22Myers-Ward%2C+R%2E+L%2E%22">Myers-Ward, R. L.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Electronic+Materials%22">Journal of Electronic Materials</searchLink>; May 2008, Vol. 37 Issue 5, p685-690, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501248935
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      – Type: doi
        Value: 10.1007/s11664-007-0306-2
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 685
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      – TitleFull: Real-Time In Situ Tracking of Gas-Phase Carbon-to-Silicon Ratio During Hot-Wall CVD Growth of SiC.
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            NameFull: Vanmil, B. L.
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            NameFull: Lew, K. K.
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            NameFull: Myers-Ward, R. L.
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            – D: 01
              M: 05
              Text: May 2008
              Type: published
              Y: 2008
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              Value: 37
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              Value: 5
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            – TitleFull: Journal of Electronic Materials
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