Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.

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Bibliographic Details
Title:	Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.
Authors:	Yang, K., Jiang, J. Q., Gu, M. Y.
Source:	Materials Science & Technology; August 2007, Vol. 23 Issue 8, p958-962, 5p
Database:	Applied Science & Technology Source

Description
ISSN:	02670836
DOI:	10.1179/174328407X192859