Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.
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| Title: | Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering. |
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| Authors: | Yang, K., Jiang, J. Q., Gu, M. Y. |
| Source: | Materials Science & Technology; August 2007, Vol. 23 Issue 8, p958-962, 5p |
| Database: | Applied Science & Technology Source |
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