Inductively Coupled Plasma Etching of InP with HBr/O2 Chemistry.
Saved in:
| Title: | Inductively Coupled Plasma Etching of InP with HBr/O2 Chemistry. |
|---|---|
| Authors: | Lim, E. L., Teng, J. H., Chong, L. F. |
| Source: | Journal of the Electrochemical Society; 2008, Vol. 155 Issue 1, pD47-D51, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
|---|---|
| DOI: | 10.1149/1.2801872 |
