APA (7th ed.) Citation

Lim, E. L., Teng, J. H., & Chong, L. F. (2008). Inductively Coupled Plasma Etching of InP with HBr/O2 Chemistry. Journal of the Electrochemical Society, 155(1), D47. https://doi.org/10.1149/1.2801872

Chicago Style (17th ed.) Citation

Lim, E. L., J. H. Teng, and L. F. Chong. "Inductively Coupled Plasma Etching of InP with HBr/O2 Chemistry." Journal of the Electrochemical Society 155, no. 1 (2008): D47. https://doi.org/10.1149/1.2801872.

MLA (9th ed.) Citation

Lim, E. L., et al. "Inductively Coupled Plasma Etching of InP with HBr/O2 Chemistry." Journal of the Electrochemical Society, vol. 155, no. 1, 2008, p. D47, https://doi.org/10.1149/1.2801872.