Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas.
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| Title: | Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas. |
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| Authors: | Yasuda, Y., Zaima, S., Kaida, T. |
| Source: | Journal of Applied Physics; March 1 1990, Vol. 67, p2603-2607, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.345465 |
