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Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas.

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Bibliographic Details
Title: Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas.
Authors: Yasuda, Y., Zaima, S., Kaida, T.
Source: Journal of Applied Physics; March 1 1990, Vol. 67, p2603-2607, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501732997
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas.
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  Data: <searchLink fieldCode="AU" term="%22Yasuda%2C+Y%2E%22">Yasuda, Y.</searchLink><br /><searchLink fieldCode="AU" term="%22Zaima%2C+S%2E%22">Zaima, S.</searchLink><br /><searchLink fieldCode="AU" term="%22Kaida%2C+T%2E%22">Kaida, T.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; March 1 1990, Vol. 67, p2603-2607, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501732997
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/1.345465
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 5
        StartPage: 2603
    Titles:
      – TitleFull: Mechanisms of silicon oxidation at low temperatures by microwave-excited O2 gas and O2-N2 mixed gas.
        Type: main
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          Name:
            NameFull: Yasuda, Y.
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          Name:
            NameFull: Zaima, S.
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            NameFull: Kaida, T.
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            – D: 01
              M: 03
              Text: March 1 1990
              Type: published
              Y: 1990
          Identifiers:
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              Value: 00218979
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              Value: 67
          Titles:
            – TitleFull: Journal of Applied Physics
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