Selective chemically assisted ion beam etching of Si, polysilicon, and SiO2 using Ni-Cr masks and Cl2.
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| Title: | Selective chemically assisted ion beam etching of Si, polysilicon, and SiO2 using Ni-Cr masks and Cl2. |
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| Authors: | Xiao, Zhaohua, Nilsson, B., Svedberg, P. |
| Source: | Journal of the Electrochemical Society; May 1990, Vol. 137, p1579-1581, 3p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2086730 |
