APA (7th ed.) Citation

Xiao, Z., Nilsson, B., & Svedberg, P. (1990). Selective chemically assisted ion beam etching of Si, polysilicon, and SiO2 using Ni-Cr masks and Cl2. Journal of the Electrochemical Society, 137, 1579. https://doi.org/10.1149/1.2086730

Chicago Style (17th ed.) Citation

Xiao, Zhaohua, B. Nilsson, and P. Svedberg. "Selective Chemically Assisted Ion Beam Etching of Si, Polysilicon, and SiO2 Using Ni-Cr Masks and Cl2." Journal of the Electrochemical Society 137 (1990): 1579. https://doi.org/10.1149/1.2086730.

MLA (9th ed.) Citation

Xiao, Zhaohua, et al. "Selective Chemically Assisted Ion Beam Etching of Si, Polysilicon, and SiO2 Using Ni-Cr Masks and Cl2." Journal of the Electrochemical Society, vol. 137, 1990, p. 1579, https://doi.org/10.1149/1.2086730.