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Selective chemically assisted ion beam etching of Si, polysilicon, and SiO2 using Ni-Cr masks and Cl2.

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Bibliographic Details
Title: Selective chemically assisted ion beam etching of Si, polysilicon, and SiO2 using Ni-Cr masks and Cl2.
Authors: Xiao, Zhaohua, Nilsson, B., Svedberg, P.
Source: Journal of the Electrochemical Society; May 1990, Vol. 137, p1579-1581, 3p
Database: Applied Science & Technology Source
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