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Investigation of High-Frequency Noise Characteristics in Tensile-Strained nMOSFETs.

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Title: Investigation of High-Frequency Noise Characteristics in Tensile-Strained nMOSFETs.
Authors: Wang, Sheng-Chun, Su, Pin, Chen, Kun-Ming
Source: IEEE Transactions on Electron Devices; March 2011, Vol. 58 Issue 3, p895-900, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501767085
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Investigation of High-Frequency Noise Characteristics in Tensile-Strained nMOSFETs.
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  Data: <searchLink fieldCode="AU" term="%22Wang%2C+Sheng-Chun%22">Wang, Sheng-Chun</searchLink><br /><searchLink fieldCode="AU" term="%22Su%2C+Pin%22">Su, Pin</searchLink><br /><searchLink fieldCode="AU" term="%22Chen%2C+Kun-Ming%22">Chen, Kun-Ming</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22IEEE+Transactions+on+Electron+Devices%22">IEEE Transactions on Electron Devices</searchLink>; March 2011, Vol. 58 Issue 3, p895-900, 6p
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1109/TED.2010.2104153
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 895
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      – TitleFull: Investigation of High-Frequency Noise Characteristics in Tensile-Strained nMOSFETs.
        Type: main
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            NameFull: Wang, Sheng-Chun
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            NameFull: Su, Pin
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            NameFull: Chen, Kun-Ming
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            – D: 01
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              Text: March 2011
              Type: published
              Y: 2011
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              Value: 58
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            – TitleFull: IEEE Transactions on Electron Devices
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