Nondestructive determination of damage depth profiles in ion-implanted semiconductors by spectroscopic ellipsometry using different optical models.
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| Title: | Nondestructive determination of damage depth profiles in ion-implanted semiconductors by spectroscopic ellipsometry using different optical models. |
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| Authors: | Fried, M., Lohner, T., Aarnink, W. A. M. |
| Source: | Journal of Applied Physics; March 15 1992, Vol. 71, p2835-2843, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.351014 |
