Residual-surfactant-free photoresist development process.
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| Title: | Residual-surfactant-free photoresist development process. |
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| Authors: | Shimada, H., Onodera, M., Shimomura, S. |
| Source: | Journal of the Electrochemical Society; June 1992, Vol. 139, p1721-1730, 10p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2069483 |
