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Residual-surfactant-free photoresist development process.

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Bibliographic Details
Title: Residual-surfactant-free photoresist development process.
Authors: Shimada, H., Onodera, M., Shimomura, S.
Source: Journal of the Electrochemical Society; June 1992, Vol. 139, p1721-1730, 10p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 502019956
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Residual-surfactant-free photoresist development process.
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  Data: <searchLink fieldCode="AU" term="%22Shimada%2C+H%2E%22">Shimada, H.</searchLink><br /><searchLink fieldCode="AU" term="%22Onodera%2C+M%2E%22">Onodera, M.</searchLink><br /><searchLink fieldCode="AU" term="%22Shimomura%2C+S%2E%22">Shimomura, S.</searchLink>
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1149/1.2069483
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 1721
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      – TitleFull: Residual-surfactant-free photoresist development process.
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            NameFull: Shimada, H.
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            NameFull: Onodera, M.
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            NameFull: Shimomura, S.
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            – D: 01
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              Text: June 1992
              Type: published
              Y: 1992
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              Value: 139
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            – TitleFull: Journal of the Electrochemical Society
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