Direct photoetching of evaporated germanium and its use in mask fabrication.
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| Title: | Direct photoetching of evaporated germanium and its use in mask fabrication. |
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| Authors: | Sullivan, M. V., Kolb, G. A. |
| Source: | Electrochemical Technology.; November 1968, Vol. 6, p430-434, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 04248090 |
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