APA (7th ed.) Citation

Sullivan, M. V., & Kolb, G. A. (1968). Direct photoetching of evaporated germanium and its use in mask fabrication. Electrochemical Technology., 6, 430.

Chicago Style (17th ed.) Citation

Sullivan, M. V., and G. A. Kolb. "Direct Photoetching of Evaporated Germanium and Its Use in Mask Fabrication." Electrochemical Technology. 6 (1968): 430.

MLA (9th ed.) Citation

Sullivan, M. V., and G. A. Kolb. "Direct Photoetching of Evaporated Germanium and Its Use in Mask Fabrication." Electrochemical Technology., vol. 6, 1968, p. 430.